DocumentCode :
1173767
Title :
Effects of poly depletion on the estimate of thin dielectric lifetime
Author :
Wang, Shoue Jen ; Chen, Ih-Chin ; Tigelaar, Howard L.
Author_Institution :
Texas Instrum. Inc., Dallas, TX, USA
Volume :
12
Issue :
11
fYear :
1991
Firstpage :
617
Lastpage :
619
Abstract :
Poly-gate depletion during the accelerated time-dependent breakdown (TDDB) test of single-doping-type capacitors (both electrodes of the doping type) results in an overestimate of dielectric lifetime at operation voltage. Simple high-field data extrapolation fails to take into account the voltage-dependent poly band bending. A three-orders-of-magnitude overestimate of lifetime at 5 V for 68-AA oxide equivalent poly/poly capacitors was found. After correcting for the poly depletion effects, the slope of the TDDB projection line decreases by 18%. The effects can be minimized by performing TDDB testing below the top poly inversion voltage. Fermi-Dirac statistics quantitatively explained the phenomenon. Calculated maximum allowable TDDB voltages for different gate doping and oxide thickness are presented as guidelines for test design.<>
Keywords :
capacitors; electric breakdown of solids; life testing; silicon; silicon compounds; 5 V; 68 A; Fermi-Dirac statistics; TDDB testing; accelerated time dependent breakdown test; estimate of thin dielectric lifetime; gate doping; guidelines for test design; high-field data extrapolation; lifetime overestimate; operation voltage; overestimate of dielectric lifetime; oxide thickness; polycrystalline Si depletion effects; polysilicon depletion effects; single-doping-type capacitors; three-orders-of-magnitude overestimate of lifetime; voltage-dependent poly band bending; Breakdown voltage; Capacitors; Dielectric breakdown; Doping; Electrodes; Extrapolation; Life estimation; Life testing; Performance evaluation; Statistics;
fLanguage :
English
Journal_Title :
Electron Device Letters, IEEE
Publisher :
ieee
ISSN :
0741-3106
Type :
jour
DOI :
10.1109/55.119216
Filename :
119216
Link To Document :
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