DocumentCode
1173786
Title
Influences of surface sulfur treatments on the temperature-dependent characteristics of HBTs
Author
Chen, Chun-Yuan ; Fu, Ssu-I ; Cheng, Shiou-Ying ; Chang, Chi-Yuan ; Tsai, Ching-Hsiu ; Yen, Chih-Hung ; Tsai, Sheng-Fu ; Liu, Rong-Chau ; Liu, Wen-Chau
Author_Institution
Dept. of Electr. Eng., Nat. Cheng-Kung Univ., Tainan, Taiwan
Volume
51
Issue
12
fYear
2004
Firstpage
1963
Lastpage
1971
Abstract
The temperature-dependent DC characteristics of InGaP-GaAs heterojunction bipolar transistors with and without sulfur treatment are systematically studied and demonstrated. Due to the use of sulfur passivation, the series resistance of base-emitter junction of studied device can be effectively reduced. In addition, the device with sulfur treatment can be operated under ultra low collector current regimes (IC≤10-11 A). Experimentally, a long-time sulfur treatment is not appropriate. In this work, the studied device with sulfur treatment for 15 min is a good choice. Furthermore, at measured temperature (298 K-398 K), the studied device with sulfur treatment can reduce collector-emitter offset voltage and the impact of emitter size effect. Moreover, as the temperature is increased, the device with sulfur treatment will exhibit higher DC current gain and more stable temperature-dependent performances. This will extend the application regimes of the studied device in low-power and communication systems.
Keywords
III-V semiconductors; gallium arsenide; heterojunction bipolar transistors; indium compounds; passivation; surface treatment; 15 min; 298 to 398 K; DC current gain; InGaP-GaAs; InGaP-GaAs heterojunction bipolar transistors; base-emitter junction; collector-emitter offset voltage reduction; communication systems; emitter size effect; low-power systems; series resistance; sulfur passivation; surface sulfur treatments; temperature-dependent characteristics; ultra low collector current; Bonding; Heterojunction bipolar transistors; Passivation; Performance gain; Radiative recombination; Size measurement; Spontaneous emission; Surface treatment; Temperature measurement; Voltage; 65; Current gain; offset voltage; sulfur treatment; temperature-dependent characteristics;
fLanguage
English
Journal_Title
Electron Devices, IEEE Transactions on
Publisher
ieee
ISSN
0018-9383
Type
jour
DOI
10.1109/TED.2004.839121
Filename
1362954
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