Title :
Photosensitivity locking technique applied to UV written planar Bragg gratings
Author :
Emmerson, G.D. ; Gawith, C.B.E. ; Watts, S.P. ; Albanis, V. ; Williams, R.B. ; McMeekin, S.G. ; Bonar, J.R. ; Laming, R.I. ; Smith, P.G.R.
Author_Institution :
Optoelectron. Res. Centre, Southampton Univ., UK
fDate :
3/20/2003 12:00:00 AM
Abstract :
A technique is presented for thermally processing deuterium loaded silica-on-silicon samples to provide air enhanced photosensitivity lifetime of at least one year at room temperature. subsequent simultaneous writing of channel waveguides and Bragg gratings resulted in grating reflections of ∼80% with a FWHM of 0.1 nm.
Keywords :
Bragg gratings; integrated optics; optical fabrication; optical waveguides; sensitivity; UV written planar Bragg gratings; channel waveguides; deuterium loaded silica-on-silicon samples; direct UV-writing; enhanced photosensitivity lifetime; photosensitivity locking technique; planar lightwave circuit fabrication process; thermal processing;
Journal_Title :
Electronics Letters
DOI :
10.1049/el:20030379
