• DocumentCode
    1174252
  • Title

    Photosensitivity locking technique applied to UV written planar Bragg gratings

  • Author

    Emmerson, G.D. ; Gawith, C.B.E. ; Watts, S.P. ; Albanis, V. ; Williams, R.B. ; McMeekin, S.G. ; Bonar, J.R. ; Laming, R.I. ; Smith, P.G.R.

  • Author_Institution
    Optoelectron. Res. Centre, Southampton Univ., UK
  • Volume
    39
  • Issue
    6
  • fYear
    2003
  • fDate
    3/20/2003 12:00:00 AM
  • Firstpage
    517
  • Lastpage
    518
  • Abstract
    A technique is presented for thermally processing deuterium loaded silica-on-silicon samples to provide air enhanced photosensitivity lifetime of at least one year at room temperature. subsequent simultaneous writing of channel waveguides and Bragg gratings resulted in grating reflections of ∼80% with a FWHM of 0.1 nm.
  • Keywords
    Bragg gratings; integrated optics; optical fabrication; optical waveguides; sensitivity; UV written planar Bragg gratings; channel waveguides; deuterium loaded silica-on-silicon samples; direct UV-writing; enhanced photosensitivity lifetime; photosensitivity locking technique; planar lightwave circuit fabrication process; thermal processing;
  • fLanguage
    English
  • Journal_Title
    Electronics Letters
  • Publisher
    iet
  • ISSN
    0013-5194
  • Type

    jour

  • DOI
    10.1049/el:20030379
  • Filename
    1192204
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=1174252