Vacuum arc deposition of carbon thin films in a low pressure of hydrogen

Author

De Azevedo, Mario Douyon ; Meunier, Jean-Luc

Author_Institution

Dept. of Chem. Eng., McGill Univ., Montreal, Que., Canada

Volume

19

Issue

5

fYear

1991

fDate

10/1/1991 12:00:00 AM

Firstpage

734

Lastpage

739

Abstract

Results on the vacuum arc deposition (VAD) of thin carbon films on silicon, tungsten, and nickel are presented for different hydrogen pressures in the arc chamber. Raman and Auger electron spectroscopy and SEM analysis show that a large variety of film structures can be obtained. Highly oriented pyrolytic graphite is formed at high hydrogen pressure and low substrate temperature. Vacuum deposition resulted in a diamondlike structure. Evidence of the presence of multicrystalline spheres of diamond in some films is also presented

Keywords

Auger effect; Raman spectra of inorganic solids; arcs (electric); carbon; discharges (electric); plasma deposition; scanning electron microscope examination of materials; Auger electron spectroscopy; Cu thin films; H; Ni; Raman spectroscopy; SEM analysis; Si; W; arc chamber; diamond; diamondlike structure; film structures; highly oriented pyrolytic graphite; low pressure; multicrystalline spheres; scanning electron microscopy; vacuum arc deposition; Electrons; Hydrogen; Nickel; Raman scattering; Semiconductor films; Silicon; Spectroscopy; Sputtering; Tungsten; Vacuum arcs;

fLanguage

English

Journal_Title

Plasma Science, IEEE Transactions on

Publisher

ieee

ISSN

0093-3813

Type

jour

DOI

10.1109/27.108406

Filename

108406