Title :
Polymeric wavelength filter based on a Bragg grating using nanoimprint technique
Author :
Ahn, Seh-Won ; Lee, Ki-Dong ; Kim, Do-Hwan ; Lee, Sang-Shin
Author_Institution :
Devices & Mater. Lab., LG Electron. Inst. of Technol., Seoul, South Korea
Abstract :
A polymeric waveguide-type wavelength filter based on a Bragg grating has been proposed and fabricated using the simple nanoimprint technique, for the first time to our knowledge. An ultraviolet transparent stamp with the single-mode waveguide pattern incorporating a surface-relief-type Bragg grating was efficiently developed using laser interference lithography and a specially designed selective dry-etching process. Using this stamp, the device fabrication was substantially simplified involving just a single-step process of imprint followed by polymer spin-coating. The achieved maximum reflection was higher than 25 dB at the center wavelength of 1569 nm. And the 3-dB bandwidth was 0.8 nm for the device length of 1.5 cm.
Keywords :
Bragg gratings; etching; light reflection; nanolithography; optical fabrication; optical filters; optical polymers; optical waveguides; spin coating; transparency; 1.5 cm; 1569 nm; Bragg grating; filter fabrication; laser interference lithography; nanoimprint technique; optical reflection; polymer spin-coating; polymeric wavelength filter; selective dry-etching process; single-mode waveguide pattern; surface-relief-type grating; ultraviolet transparent stamp; waveguide-type filter; Bragg gratings; Filters; Interference; Lithography; Optical design; Polymers; Process design; Surface emitting lasers; Surface waves; Waveguide lasers; Gratings; optical filters; optical waveguides; waveguide components; waveguide filters;
Journal_Title :
Photonics Technology Letters, IEEE
DOI :
10.1109/LPT.2005.854404