A new approach to determine the effective channel length and the drain-and-source series resistance of miniaturized MOSFET´s

A new decoupled C-V method is proposed to determine the intrinsic (effective) channel region and extrinsic overlap region for miniaturized MOSFET´s. In this approach, a unique channel-length-independent extrinsic overlap region is extracted at a critical gate bias, so bias-independent effective channel lengths (L_eff) are achieved. Furthermore, the two-dimensional (2D) charge sharing effect is separated from the effective channel region. Based on this L_eff and the associated bias-dependent channel mobility, μ_eff , the drain-and-source series resistance (R_DS) can be derived from the I-V characteristics for each device individually. For the first time, the assumption or approximation for R_DS and μ_eff can be avoided, thus the difficulties and controversy encountered in the conventional I-V method can be solved. The 2D charge sharing effect is incorporated into the bias-dependent R_DS. This bias dependence is closely related to the drain/source doping profile and the channel dopant concentration. The proposed L_eff and R_DS extraction method has been verified by an analytical I-V model which shows excellent agreements with the measured I-V characteristics