DocumentCode :
1179926
Title :
Short channel threshold dependence of the inversion channel heterostructure field effect transistor
Author :
Taylor, G.W. ; Kiely, P.A.
Author_Institution :
AT&T Bell Labs., Holmdel, NJ, USA
Volume :
41
Issue :
10
fYear :
1994
fDate :
10/1/1994 12:00:00 AM
Firstpage :
1871
Lastpage :
1873
Abstract :
The threshold voltage dependence on the channel length for the inversion channel HFET is investigated. Modifying the charge equations to account for source and drain depletion into the channel region yields a length dependent threshold voltage equation. It is shown theoretically that the threshold may increase or decrease with decreasing gate length as the doping parameters are changed, which is supported by experiment. Using the new threshold equation parameters have been found which should allow length invariant thresholds
Keywords :
junction gate field effect transistors; channel length; charge equations; doping parameters; drain depletion; inversion channel heterostructure field effect transistor; short channel; source depletion; threshold voltage; Doping; Equations; FETs; HEMTs; Heterojunctions; MODFETs; Optoelectronic devices; P-n junctions; Semiconductor process modeling; Threshold voltage;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/16.324602
Filename :
324602
Link To Document :
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