DocumentCode :
1181534
Title :
Thermal Modeling and Device Noise Properties of Three-Dimensional–SOI Technology
Author :
Chen, Tze Wee ; Chun, Jung-Hoon ; Lu, Yi-Chang ; Navid, Reza ; Wang, Wei ; Chen, Chang-Lee ; Dutton, Robert W.
Author_Institution :
Center for Integrated Syst., Stanford Univ., Stanford, CA
Volume :
56
Issue :
4
fYear :
2009
fDate :
4/1/2009 12:00:00 AM
Firstpage :
656
Lastpage :
664
Abstract :
Thermal test structures and ring oscillators (ROs) are fabricated in 0.18-mum three-dimensional (3-D)-SOI technology. Measurements and electrothermal simulations show that thermal and parasitic effects due to 3-D packaging have a significant impact on circuit performance. A physical thermal model is parameterized to provide better prediction of circuit performance in 3-D technologies. Electrothermal simulations using the thermal model show good agreement with measurement data; the model is applicable for different circuits designed in the 3-D-SOI technology. By studying the phase noise of ROs, the device noise properties of 3-D-SOI technology are also characterized and compared with conventional bulk CMOS technology.
Keywords :
integrated circuit modelling; integrated circuit noise; integrated circuit packaging; silicon-on-insulator; 3D SOI technology; 3D packaging; device noise properties; electrothermal simulations; ring oscillators; size 0.18 mum; thermal modeling; CMOS technology; Circuit noise; Circuit optimization; Circuit simulation; Circuit testing; Electrothermal effects; Packaging; Phase noise; Ring oscillators; Semiconductor device modeling; 3-D silicon-on-insulator; Device noise; electrothermal; thermal modeling; three-dimensional (3-D) integrated circuit;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/TED.2009.2014188
Filename :
4796307
Link To Document :
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