Title :
Scaling Limitations for Flexural Beams Used in Electromechanical Devices
Author :
Lee, Donovan ; Osabe, Taro ; Liu, Tsu-Jae King
Author_Institution :
Dept. of Electr. Eng. & Comput. Sci., Univ. of California, Berkeley, CA, USA
fDate :
4/1/2009 12:00:00 AM
Abstract :
Limitations for the miniaturization of flexural beams used in electromechanical devices are examined using the numerical analysis of the Euler-Bernoulli equation. The utilization of structural materials with high strain limit, in conjunction with innovations in processes and structures, will be needed to scale nanoelectromechanical systems beam lengths into the sub-100 nanometer regime.
Keywords :
beams (structures); flexible structures; nanoelectromechanical devices; Euler-Bernoulli equation; flexural beams scaling limitations; high strain limit; nanoelectromechanical systems beam lengths; numerical analysis; Capacitive sensors; Digital relays; Electromechanical devices; Leakage current; Manufacturing; Nanoelectromechanical systems; Numerical analysis; Power system relaying; Shape; Tunneling; Microelectromechanical systems; nanoelectromechanical systems; relays; scaling;
Journal_Title :
Electron Devices, IEEE Transactions on
DOI :
10.1109/TED.2009.2014190
