• DocumentCode
    1181761
  • Title

    Scaling Limitations for Flexural Beams Used in Electromechanical Devices

  • Author

    Lee, Donovan ; Osabe, Taro ; Liu, Tsu-Jae King

  • Author_Institution
    Dept. of Electr. Eng. & Comput. Sci., Univ. of California, Berkeley, CA, USA
  • Volume
    56
  • Issue
    4
  • fYear
    2009
  • fDate
    4/1/2009 12:00:00 AM
  • Firstpage
    688
  • Lastpage
    691
  • Abstract
    Limitations for the miniaturization of flexural beams used in electromechanical devices are examined using the numerical analysis of the Euler-Bernoulli equation. The utilization of structural materials with high strain limit, in conjunction with innovations in processes and structures, will be needed to scale nanoelectromechanical systems beam lengths into the sub-100 nanometer regime.
  • Keywords
    beams (structures); flexible structures; nanoelectromechanical devices; Euler-Bernoulli equation; flexural beams scaling limitations; high strain limit; nanoelectromechanical systems beam lengths; numerical analysis; Capacitive sensors; Digital relays; Electromechanical devices; Leakage current; Manufacturing; Nanoelectromechanical systems; Numerical analysis; Power system relaying; Shape; Tunneling; Microelectromechanical systems; nanoelectromechanical systems; relays; scaling;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/TED.2009.2014190
  • Filename
    4796329