Genetic algorithm-based characterization of the optical properties of flame-hydrolysis deposited silica waveguides

Author

García-Blanco, Sonia ; Alfaro-Cid, Eva ; De La Rue, Richard M. ; Aitchison, J. Stewart

Author_Institution

Inst. Tecnologico de Informatica, Univ. Politecnica de Valencia, Spain

Volume

22

Issue

12

fYear

2004

Firstpage

2801

Lastpage

2807

Abstract

Genetic algorithms have been demonstrated to be a robust method for the calculation of the refractive-index profile of annealed germanium-doped flame-hydrolysis deposited (FHD) silica layers using measurements of the effective refractive indexes of the different modes of propagation. A nonuniform refractive-index profile in depth was obtained, which agrees well with the germanium concentration and density profiles measured for the films.

Keywords

annealing; genetic algorithms; germanium; optical films; optical waveguides; refractive index; silicon compounds; thin films; SiO₂:Ge; annealed germanium-doped silica; density profiles; flame-hydrolysis deposited silica; genetic algorithm; germanium concentration; nonuniform refractive-index profile; optical films; optical properties; propagation modes; refractive-index profile; silica waveguides; Annealing; Genetic algorithms; Optical films; Optical propagation; Optical refraction; Optical variables control; Optical waveguides; Refractive index; Robustness; Silicon compounds; Flame-hydrolysis silica; Rutherford backscattering spectroscopy (RBS); genetic algorithms; silica-on-silicon; waveguides;

fLanguage

English

Journal_Title

Lightwave Technology, Journal of

Publisher

ieee

ISSN

0733-8724

Type

jour

DOI

10.1109/JLT.2004.834833

Filename

1366480