Title :
Direct UV writing of buried singlemode channel waveguides in Ge-doped silica films
Author :
Svalgaard, M. ; Poulsen, C.V. ; Bjarklev, A. ; Poulsen, Ole
Author_Institution :
Microelectronics Center, Tech. Univ. Denmark, Lyngby
fDate :
8/18/1994 12:00:00 AM
Abstract :
Germanosilicate film waveguides fabricated by plasma enhanced chemical vapour deposition have been shown to possess high sensitivity towards UV induced index changes. As an illustration of possible future applications, direct point-to-point writing of buried singlemode channel waveguides using a focused, continuous wave, UV laser beam is demonstrated
Keywords :
germanium; integrated optics; laser beam applications; optical films; optical waveguides; optical workshop techniques; plasma CVD coatings; silicon compounds; Ge-doped silica films; SiO2:Ge; buried singlemode channel waveguides; direct UV writing; focused continuous wave UV laser beam; germanosilicate film waveguides; plasma enhanced chemical vapour deposition; point-to-point writing; refractive index;
Journal_Title :
Electronics Letters
DOI :
10.1049/el:19940935
