DocumentCode
1183043
Title
Comparative optical study of GaAs1-xNx/GaAs and BxGa1-xAs/GaAs epilayers
Author
Saidi, F. ; Hassen, F. ; Maaref, H. ; Dumont, H. ; Monteil, Y.
Author_Institution
Lab. de Phys. des Semiconducteurs et des Composants Electroniques, Monastir, Tunisia
Volume
151
Issue
5
fYear
2004
Firstpage
342
Lastpage
345
Abstract
Optical studies of GaAs1-xNx/GaAs and BxGa1-xAs/GaAs epilayers grown by metal organic chemical vapour deposition (MOCVD), with various nitrogen (N) and boron (B) compositions, have been achieved by photoluminescence spectroscopy (PL) as a function of the excitation density and the sample temperature (10-300 K). The experiments have shown that the GaAsN PL band emission presents a more significant red shift than the BGaAs emission. For the GaAsN a reduction of 110 meV/1%N is shown, but for the BGaAs the PL band emission shifts to the low-energy side by up to 2.5%. A more significant blue shift of the PL bands with increasing the excitation density has been observed for GaAsN compared to BGaAs epilayer structures. The temperature dependence of the PL peak energy has shown S-shaped behaviour for both structures, but the localisation effects are more important in GaAsN than in BGaAs. Based on these experimental results, it is shown that B incorporation does not cause large modification of the band structure in BxGa1-xAs alloys compared to pure GaAsN structures.
Keywords
III-V semiconductors; MOCVD; boron; energy gap; gallium arsenide; gallium compounds; nitrogen; photoluminescence; red shift; semiconductor doping; semiconductor epitaxial layers; semiconductor growth; 10 to 300 K; BxGa1-xAs-GaAs; BxGa1-xAs/GaAs epilayers; GaAs1-xNx-GaAs; GaAs1-xNx/GaAs epilayers; MOCVD; band structure; blue shift; excitation density; localisation effects; metal organic chemical vapour deposition; photoluminescence spectroscopy; red shift;
fLanguage
English
Journal_Title
Optoelectronics, IEE Proceedings -
Publisher
iet
ISSN
1350-2433
Type
jour
DOI
10.1049/ip-opt:20040938
Filename
1367384
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