• DocumentCode
    1183102
  • Title

    Carrier recombination processes in GaAsN: from the dilute limit to alloying

  • Author

    Intartaglia, R. ; Taliercio, T. ; Lefebvre, P. ; Valvin, P. ; Bretagnon, T. ; Guillet, T. ; Gil, B. ; Tisch, U. ; Finkman, E. ; Salzman, J. ; Pinault, M.-A. ; Tournié, E.

  • Author_Institution
    Groupe d´´Etude des Semiconducteurs, CNRS-Univ. Montpellier, France
  • Volume
    151
  • Issue
    5
  • fYear
    2004
  • Firstpage
    365
  • Lastpage
    368
  • Abstract
    Low-temperature time-resolved photoluminescence (TR-PL) experiments were used to study the dependence on nitrogen composition of the nature, the energy and the dynamics of radiative carrier recombinations in GaAs1-xNx alloys. Epitaxial layers were grown on [001] GaAs substrates by molecular beam epitaxy using solid sources for group-III and As elements, and a radiofrequency plasma source for N. The nitrogen content, measured by secondary ion mass spectroscopy, was in the range 5 × 10-5 - 7 × 10-2. PL spectra are dominated by the emission from the discrete states of nitrogen-based excitonic complexes for the very low x regime (around 5 × 10-5), showing exponential time decays. For x larger than 5 × 10-4, PL spectra are rather dominated by emission from a continuum of states originating from nitrogen clusters. In this case, nonexponential time decays are obtained. It is shown that these PL decays involve complex carrier transfers between the various available states. Changing the nitrogen content changes the recombination mechanism by changing the distance between the clusters.
  • Keywords
    III-V semiconductors; alloying; electron-hole recombination; excitons; gallium arsenide; gallium compounds; molecular beam epitaxial growth; photoluminescence; plasma deposition; secondary ion mass spectra; semiconductor epitaxial layers; semiconductor growth; time resolved spectra; GaAs; GaAs substrates; GaAs1-xNx alloys; GaAsN; alloying; carrier recombination; complex carrier transfers; dilute limit; discrete states emission; epitaxial layers; exponential time decays; low-temperature photoluminescence; molecular beam epitaxy; nitrogen clusters; nitrogen composition; nitrogen-based excitonic complexes; nonexponential time decays; radiative recombination; radiofrequency plasma source; secondary ion mass spectroscopy; time-resolved photoluminescence;
  • fLanguage
    English
  • Journal_Title
    Optoelectronics, IEE Proceedings -
  • Publisher
    iet
  • ISSN
    1350-2433
  • Type

    jour

  • DOI
    10.1049/ip-opt:20040867
  • Filename
    1367389