• DocumentCode
    1183228
  • Title

    (Ga,In)(N,As)-based solar cells grown by molecular beam epitaxy

  • Author

    Damilano, B. ; Barjon, J. ; Wan, S.W. ; Duboz, J.Y. ; Leroux, M. ; Laügt, M. ; Massies, J.

  • Author_Institution
    CNRS-CRHEA, Valbonne, France
  • Volume
    151
  • Issue
    5
  • fYear
    2004
  • Firstpage
    433
  • Lastpage
    436
  • Abstract
    (Ga,In)(N,As) could be a promising material for use in monolithic four-junction solar cells since it can be grown lattice-matched to substrates such as GaAs and Ge, and its bandgap of 1 eV is complementary to that of the three other semiconductors Ge, GaAs and (Ga,In)P. The growth by molecular beam epitaxy of (Ga,In)(N,As)-based solar cells is reported. It was checked by high-resolution X-ray diffraction that the 1-μm-thick (Ga,In)(N,As) layers were lattice-matched to GaAs. The spectral responses of the solar cells provide evidence that (Ga,In)(N,As) converts photons with energy down to 0.9 eV. The comparison with reference GaAs solar cells indicates, however, a degradation of the short-circuit current, revealing short minority-carrier diffusion lengths. A (Ga,In)(N,As) 2 mm×2.5 mm solar cell with a p-i (Ga,In)(N,As) n-GaAs structure delivers a 2.1 mA/cm2 short-circuit current and has an open-circuit voltage of 0.264 V under natural solar illumination (air mass ∼1.5).
  • Keywords
    III-V semiconductors; X-ray diffraction; carrier lifetime; gallium compounds; indium compounds; molecular beam epitaxial growth; semiconductor growth; solar cells; wide band gap semiconductors; 0.264 V; 1 mum; 2 mm; 2.5 mm; GaInNAs; X-ray diffraction; lattice matching; minority-carrier diffusion length; molecular beam epitaxy; short-circuit current; solar cells;
  • fLanguage
    English
  • Journal_Title
    Optoelectronics, IEE Proceedings -
  • Publisher
    iet
  • ISSN
    1350-2433
  • Type

    jour

  • DOI
    10.1049/ip-opt:20040890
  • Filename
    1367402