PARSEC-process analysis with recipe support for etcher control

Author

Budge, T. ; Craven, S. ; Duran, S. ; Pearson, J.T. ; Welch, R. ; Wossum, M.

Author_Institution

Texas Instrum. Inc., Lubbock, TX, USA

Volume

3

Issue

1

fYear

1990

fDate

2/1/1990 12:00:00 AM

Firstpage

28

Lastpage

32

Abstract

The authors describe PARSEC, a system developed to automate processing, perform endpoint signal analysis, and monitor wafer movement within the plasma area. The system provides automatic downloading of process recipes, detection of defined process problems by the automated analysis of endpoint signals, automatic archiving of these signals, and automated data logging for increased lot-tracking efficiency. The system hardware, software, support tools, implementation, performance and results are described

Keywords

computerised monitoring; computerised signal processing; electronic engineering computing; integrated circuit manufacture; manufacturing data processing; microcomputer applications; process computer control; semiconductor device manufacture; sputter etching; Ethernet LAN; PARSEC; Unix based microcomputers; automated data logging; automated process management system; automatic archiving; automatic downloading; endpoint signal analysis; etcher control; lot-tracking efficiency; plasma etching; process analysis; process recipes; recipe support; semiconductor wafer fabrication; software; support tools; system hardware; wafer movement monitoring; Automatic control; Computerized monitoring; Etching; Hardware; Plasma applications; Plasma materials processing; Signal analysis; Signal processing; Software performance; Software systems;

fLanguage

English

Journal_Title

Semiconductor Manufacturing, IEEE Transactions on

Publisher

ieee

ISSN

0894-6507

Type

jour

DOI

10.1109/66.47973

Filename

47973