• DocumentCode
    1184328
  • Title

    Lifting Field of Free Conducting Particles in Compressed SF6 with Dielectric Coated Electrodes

  • Author

    Parekh, H. ; Srivastava, K.D. ; van Heeswijk, R.G.

  • Author_Institution
    Department of Electrical Engineering University of Waterloo
  • Issue
    3
  • fYear
    1979
  • fDate
    5/1/1979 12:00:00 AM
  • Firstpage
    748
  • Lastpage
    758
  • Abstract
    The lifting field of a free conducting particle (FCP) situated on a dielectric coated electrode in compressed SF6 gas is calculated based on two different particle charging mechanisms-partial discharges occurring in the gas surrounding the particle and charge conduction through the dielectric coating. Calculated values are compared with experimental results obtained for different thicknesses of anodized (Al203) coatings and at different gas pressures. It is suggested that at lower pressures a partial discharge mechanism is predominant whereas at higher pressures a charge conduction mechanism is predominant.
  • Keywords
    Coatings; Contamination; Corona; Dielectrics; Electrodes; Electrostatics; Gas insulation; Partial discharges; Sulfur hexafluoride; Voltage;
  • fLanguage
    English
  • Journal_Title
    Power Apparatus and Systems, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9510
  • Type

    jour

  • DOI
    10.1109/TPAS.1979.319287
  • Filename
    4113543