Buried-oxide silicon-on-insulator structures. II. Waveguide grating couplers

Author

Emmons, Robert M. ; Hall, Dennis G.

Author_Institution

Inst. of Opt., Rochester Univ., NY, USA

Volume

28

Issue

1

fYear

1992

fDate

1/1/1992 12:00:00 AM

Firstpage

164

Lastpage

175

Abstract

For pt.I, see ibid., vol.28, no.1, p.157-63 (1992). Grating couplers formed in buried-oxide silicon-on-insulator structures are analyzed using both a convergent Block wave approach and a simple approximate method. Strong interface reflections that occur during grating coupling can cause interference effects which result in variations in coupling efficiency and coupling length by an order of magnitude when varying grating period and film thickness parameters. Results indicate that proper coupler design is essential in order to obtain efficient coupling

Keywords

approximation theory; diffraction gratings; integrated optics; optical couplers; optical waveguide theory; SIMOX process; approximate method; buried-oxide silicon-on-insulator structures; convergent Block wave approach; coupler design; coupling efficiency; coupling length; efficient coupling; film thickness; grating coupling; grating period; interface reflections; interference effects; waveguide grating couplers; Couplers; Diffraction gratings; Gallium arsenide; Geometry; Insulation; Interference; Optical films; Optical reflection; Optical waveguides; Silicon on insulator technology;

fLanguage

English

Journal_Title

Quantum Electronics, IEEE Journal of

Publisher

ieee

ISSN

0018-9197

Type

jour

DOI

10.1109/3.119511

Filename

119511