• DocumentCode
    118514
  • Title

    A new designed trench structure to reduce the wafer warpage in wafer level packaging process

  • Author

    Chunsheng Zhu ; Heng Lee ; Jiaotuo Ye ; Gaowei Xu ; Le Luo

  • Author_Institution
    State Key Lab. of Transducer Technol., Shanghai Inst. of Microsyst. & Inf. Technol. (SIMIT), Shanghai, China
  • fYear
    2014
  • fDate
    12-15 Aug. 2014
  • Firstpage
    606
  • Lastpage
    609
  • Abstract
    Wafer warpage in wafer level packaging process poses threats to wafer handling, process qualities, and can also lead to unacceptable reliability problems. With larger diameter wafer adopted, this issue becomes more serious. In the paper, a new designed trench structure was introduced in WLP process to reduce the final wafer warpage. Both experiment and simulation methods are used to investigated the effect of the trenches on the wafer warpage. The result indicates that, by forming deep trenches, the stress of individual dies is decoupled and the total the wafer warpage will be decreased. The effect of the geometry of these trenches on the mechanical behavior of the wafer was further studied by simulation.
  • Keywords
    reliability; wafer level packaging; WLP process; deep trenches; diameter wafer; mechanical behavior; reliability problems; trench structure; wafer level packaging process; wafer warpage reduction; Electronic packaging thermal management; Electronics packaging; Packaging; Semiconductor device modeling; Silicon; Stress; Wafer scale integration; trench structure; wafer level packaging; wafer warpage;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electronic Packaging Technology (ICEPT), 2014 15th International Conference on
  • Conference_Location
    Chengdu
  • Type

    conf

  • DOI
    10.1109/ICEPT.2014.6922729
  • Filename
    6922729