Title :
A reasonably practical XUV laser for applications
Author :
Clement, T.S. ; Tóth, C. ; Wu, J. ; Young, J.F.
Author_Institution :
Dept. of Electr. & Comput. Eng., William Marsh Rice Univ., Houston, TX, USA
fDate :
10/1/1994 12:00:00 AM
Abstract :
We describe a laboratory-scale 109 nm Xe Auger laser pumped by an all-commercial high-repetition-rate Nd:YAG laser system. The Xe laser provides pulse energies up to 1 μJ, and an average flux of 3×10 12 photons/s at 11.5 eV. Measurements of the gain, output energy, and output beam shape are reported, along with an investigation of the time dependence of the gain
Keywords :
X-ray lasers; gas lasers; laser beam applications; laser beams; optical pumping; xenon; 1 muJ; 109 nm; 11.5 eV; Xe; YAG:Nd; YAl5O12:Nd; all-commercial high-repetition-rate Nd:YAG laser system; average flux; gain; laboratory-scale Xe Auger laser; output beam shape; output energy; practical XUV laser; pulse energies; time dependence; Energy measurement; Gain measurement; Laboratories; Laser applications; Laser beams; Laser excitation; Optical pulses; Pump lasers; Shape measurement; Time measurement;
Journal_Title :
Quantum Electronics, IEEE Journal of
