Title :
Fabrication of spatial walk-off polarizing films by oblique deposition
Author :
Shiraishi, Kazuo ; Matsumura, Kazuhito
Author_Institution :
Fac. of Eng., Utsunomiya Univ., Japan
fDate :
10/1/1994 12:00:00 AM
Abstract :
A spatial walk-off polarizer that utilizes form-birefringence in an obliquely deposited thick film is proposed. The film is composed of two substances, slant needle-like microcolumns and resultant fine voids around them. The structure has the uniaxial birefringence whose optic axis is parallel to the column/void axis. The basic operation was confirmed with tantalum-oxide thick films deposited onto beveled silica substrates. The spatial walk-off characteristic has clearly been observed, and the maximum polarization-split angle is measured to be 7.3°, being larger than that of existing polarizers such as those made of rutile and calcite
Keywords :
birefringence; coating techniques; integrated optics; optical films; optical polarisers; substrates; tantalum compounds; thick films; voids (solid); SiO2; Ta2O5; beveled silica substrates; calcite; column/void axis; fine voids; form-birefringence; maximum polarization-split angle; oblique deposition; obliquely deposited thick film; optic axis; rutile; slant needle-like microcolumns; spatial walk-off characteristic; spatial walk-off polarizer; spatial walk-off polarizing film fabrication; tantalum-oxide thick films; uniaxial birefringence; Apertures; Birefringence; Fabrication; Optical films; Optical polarization; Optical refraction; Optical scattering; Optical variables control; Refractive index; Thick films;
Journal_Title :
Quantum Electronics, IEEE Journal of
