Fabrication of spatial walk-off polarizing films by oblique deposition

Author

Shiraishi, Kazuo ; Matsumura, Kazuhito

Author_Institution

Fac. of Eng., Utsunomiya Univ., Japan

Volume

30

Issue

10

fYear

1994

fDate

10/1/1994 12:00:00 AM

Firstpage

2417

Lastpage

2420

Abstract

A spatial walk-off polarizer that utilizes form-birefringence in an obliquely deposited thick film is proposed. The film is composed of two substances, slant needle-like microcolumns and resultant fine voids around them. The structure has the uniaxial birefringence whose optic axis is parallel to the column/void axis. The basic operation was confirmed with tantalum-oxide thick films deposited onto beveled silica substrates. The spatial walk-off characteristic has clearly been observed, and the maximum polarization-split angle is measured to be 7.3°, being larger than that of existing polarizers such as those made of rutile and calcite

Keywords

birefringence; coating techniques; integrated optics; optical films; optical polarisers; substrates; tantalum compounds; thick films; voids (solid); SiO₂; Ta₂O₅; beveled silica substrates; calcite; column/void axis; fine voids; form-birefringence; maximum polarization-split angle; oblique deposition; obliquely deposited thick film; optic axis; rutile; slant needle-like microcolumns; spatial walk-off characteristic; spatial walk-off polarizer; spatial walk-off polarizing film fabrication; tantalum-oxide thick films; uniaxial birefringence; Apertures; Birefringence; Fabrication; Optical films; Optical polarization; Optical refraction; Optical scattering; Optical variables control; Refractive index; Thick films;

fLanguage

English

Journal_Title

Quantum Electronics, IEEE Journal of

Publisher

ieee

ISSN

0018-9197

Type

jour

DOI

10.1109/3.328615

Filename

328615