DocumentCode :
11867
Title :
Impact of Local Interconnects on Timing and Power in a High Performance Microprocessor
Author :
Shelar, R.S. ; Patyra, M.
Author_Institution :
Intel Corp., Austin, TX, USA
Volume :
32
Issue :
10
fYear :
2013
fDate :
Oct. 2013
Firstpage :
1623
Lastpage :
1627
Abstract :
In nanometer technologies, local interconnects are believed to cause a major impact on timing and power in VLSI circuits. To assess the impact of the interconnects on timing and power in a real high performance microprocessor design in a quantitative manner, this article presents results from an extensive study carried out on RTL-to-layout synthesized blocks in a 45-nm technology core. The study shows that the interconnects in these blocks account for 30% of the cycle time, on an average, on the worst internal timing paths and contribute nearly one-third to the power dissipation. This points to severity of impact due to the interconnects in today´s high performance designs.
Keywords :
VLSI; integrated circuit interconnections; integrated circuit layout; microprocessor chips; nanotechnology; RTL-to-layout; VLSI circuits; high performance microprocessor; local interconnects; nanometer technologies; nanotechnology core; power dissipation; size 45 nm; synthesized blocks; worst internal timing paths; Clocks; Delays; Integrated circuit interconnections; Microprocessors; Repeaters; Wires; Interconnects; microprocessors; power; timing;
fLanguage :
English
Journal_Title :
Computer-Aided Design of Integrated Circuits and Systems, IEEE Transactions on
Publisher :
ieee
ISSN :
0278-0070
Type :
jour
DOI :
10.1109/TCAD.2013.2266404
Filename :
6601022
Link To Document :
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