DocumentCode :
1187057
Title :
Elimination of kink phenomena and drain current hysteresis in InP-based HEMTs with a direct ohmic structure
Author :
Sawada, Ken ; Arai, Tomoyuki ; Takahashi, Tsuyoshi ; Hara, Naoki
Author_Institution :
Fujitsu Labs. Ltd., Kanagawa, Japan
Volume :
50
Issue :
2
fYear :
2003
Firstpage :
310
Lastpage :
314
Abstract :
We eliminated kink phenomena and Ids hysteresis in a double-doped InP-based HEMT without degrading its frequency performance by fabricating direct ohmic contacts in the InGaAs channel. A direct ohmic structure lets us control current paths in the device and relax the electric field at the recess edge of the drain side. As a result, we can suppress impact ionization and decrease the hole currents that originate from the high electric field region at the recess edge of the drain side. Kink phenomena are eliminated in the direct ohmic structure. We also suggest a hole trap mechanism to explain the appearance of hysteresis in the I-V characteristic of the conventional nonalloyed ohmic structure device.
Keywords :
III-V semiconductors; doping profiles; high electron mobility transistors; hysteresis; impact ionisation; indium compounds; ohmic contacts; I-V characteristic hysteresis; Ids hysteresis; InGaAs; InGaAs channel; InP; InP-based HEMT; MODFET; Ni-AuGe-Au; direct ohmic structure; double-doped HEMT; drain current hysteresis elimination; high electric field region; hole current reduction; hole trap mechanism; impact ionization suppression; kink phenomena elimination; Etching; Frequency; Gold; HEMTs; Hysteresis; Impact ionization; Indium compounds; Indium gallium arsenide; MODFETs; Optical fiber communication;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/TED.2002.808555
Filename :
1196071
Link To Document :
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