Title :
Impact ionization measurements and modeling for power PHEMT
Author :
Baksht, Tamara ; Solodky, Sanelia ; Leibovitch, M. ; Bunin, G. ; Shapira, Yoram
Author_Institution :
Dept. of Electr. Eng.-Phys. Electron., Tel-Aviv Univ., Ramat-Aviv, Israel
Abstract :
A systematic study of impact ionization in pseudomorphic high electron mobility transistors (PHEMTs) has been carried out using temperature-dependent electrical measurements as well as modeling for optimizing the power performance of the devices through the best layout parameters. A measurement procedure makes it possible to define a safe transistor operation region is proposed. Impact ionization in the channel is parameterized by specific gate current and voltage values. Temperature-dependent measurements are shown to provide distinction between the impact ionization current and the thermionic field emission current. A methodology for defining an optimum vertical structure and a lateral layout for a given application and operational conditions is developed. Empirical models for optimum lateral layout for a power application were developed based on a statistical "Device Zoo" approach. The results point to an optimal gate-to-drain distance for minimum impact ionization current.
Keywords :
impact ionisation; power HEMT; semiconductor device breakdown; semiconductor device measurement; semiconductor device models; high breakdown voltages; high electron mobility transistors; high output power; impact ionization current; impact ionization measurements; impact ionization modeling; layout parameters; mapping measurement technique; optimal gate-to-drain distance; optimum lateral layout; optimum vertical structure; power PHEMT; power performance optimization; pseudomorphic HEMTs; safe transistor operation region; statistical approach; temperature-dependent electrical measurements; Electric variables measurement; Electron mobility; HEMTs; Impact ionization; MODFETs; PHEMTs; Power measurement; Power system modeling; Temperature measurement; Voltage;
Journal_Title :
Electron Devices, IEEE Transactions on
DOI :
10.1109/TED.2003.809038