DocumentCode
118744
Title
Effect of waveguide thickness layer on spectral resonance of a Guided Mode Resonance Filter
Author
Saleem, Muhammad Rizwan ; Ali, Raian ; Honkanen, S. ; Turunen, Jari
Author_Institution
Inst. of Photonics, Univ. of Eastern Finland, Joensuu, Finland
fYear
2014
fDate
14-18 Jan. 2014
Firstpage
39
Lastpage
43
Abstract
We demonstrated cost-effective Guided Mode Resonance Filters (GMRFs) that are diffraction gratings with spectrally narrow reflectance peaks due to resonance anomalies and couple incident light into a semi-guided mode in a corrugated waveguide. The GMRF consists of a single high index dielectric layer on a periodically corrugated transparent substrate to couple light. The GMRFs are designed by Fourier Modal Method (FMM), a numerical tool based on rigorous calculations of electromagnetic diffraction theory. In FMM the field is expanded in different regimes with the application of boundary conditions at each interface. GMRFs in polymer materials (polycarbonate) are fabricated by Nano-Imprint Lithography (NIL) from a master silicon-stamp. The master Si-stamp is fabricated by the exposure of Electron Beam Lithography (EBL) on a negative & binary tone resist, Hydrogen silsesquioxane (HSQ) to make sub-wavelength grating structures. The fabricated gratings are coated by a high refractive index TiO2 amorphous thin layer using Atomic Layer Deposition (ALD). GMRFs are demonstrated both theoretically and experimentally to shift spectral resonance towards longer wavelengths with the increase in TiO2 thickness.
Keywords
amorphous state; atomic layer deposition; diffraction gratings; electromagnetic wave diffraction; electron beam lithography; optical waveguide filters; polymers; refractive index; resonator filters; silicon; soft lithography; titanium compounds; Fourier modal method; Si; TiO2; atomic layer deposition; boundary conditions; corrugated waveguide; diffraction gratings; electromagnetic diffraction theory; electron beam lithography; guided mode resonance filter; high refractive index TiO2 amorphous thin layer; hydrogen silsesquioxane; master silicon-stamp; nanoimprint lithography; negative binary tone resist; periodically corrugated transparent substrate; polycarbonate; polymer materials; reflectance; single high index dielectric layer; spectral resonance; waveguide thickness layer effect; Films; Filtering theory; Gratings; Optical filters; Optical waveguides; Reflectivity;
fLanguage
English
Publisher
ieee
Conference_Titel
Applied Sciences and Technology (IBCAST), 2014 11th International Bhurban Conference on
Conference_Location
Islamabad
Type
conf
DOI
10.1109/IBCAST.2014.6778117
Filename
6778117
Link To Document