In situ magnetoresistance measurements of a nanoconstricted nickel-iron film with in-plane configuration

Author

Ohsawa, Yuichi

Author_Institution

Corp. Res. Dev. Center, Toshiba Corp., Kawasaki, Japan

Volume

41

Issue

10

fYear

2005

Firstpage

2577

Lastpage

2579

Abstract

A test element (TE) with an Ni-Fe point contact (PC) in planar configuration was fabricated using an etching process with a horizontal incidence ion beam. Successive in situ magnetoresistance (MR) measurements were carried out in the etching apparatus without breaking the vacuum to prevent the oxidation of the PC. The TE showed the MR ratio around 12%, which was much larger than an anisotropic MR ratio of the film. It showed low (high) resistance with a magnetic field direction of parallel (antiparallel) magnetic geometry of the pinned and free area.

Keywords

enhanced magnetoresistance; etching; magnetic domains; magnetic fields; magnetic thin films; nickel alloys; point contacts; MR measurement; MR ratio; Ni-Fe point contact; NiFe; etching process; horizontal incidence ion beam; magnetic domains; magnetic field direction; magnetoresistance measurement; nanoconstricted nickel-iron film; nanotechnology; nickel alloys; planar configuration; test element; Anisotropic magnetoresistance; Electrical resistance measurement; Etching; Ion beams; Magnetic anisotropy; Magnetic field measurement; Magnetic films; Oxidation; Tellurium; Testing; Magnetic domains; magnetoresistance; nanotechnology; nickel alloys;

fLanguage

English

Journal_Title

Magnetics, IEEE Transactions on

Publisher

ieee

ISSN

0018-9464

Type

jour

DOI

10.1109/TMAG.2005.854665

Filename

1519053