Title :
Tunneling current-induced butterfly-shaped domains and magnetization switching in DBMTJs
Author :
Zhao, S.F. ; Zhao, J. ; Zeng, Z.M. ; Han, X.F. ; Yu, A.C.C. ; Ando, Y. ; Miyazaki, T.
Author_Institution :
State Key Lab. of Magnetism, Beijing Nat. Lab. for Condensed Matter, China
Abstract :
Double barrier magnetic tunnel junctions (DBMTJs) with the layer architecture of Ta (5 nm)/Cu (20 nm)/Ni79Fe21(10 nm)/Ir22Mn78 (12 nm)/Co75Fe25 (4 nm)/Al (0.9 nm)-oxide/Ni79Fe21(3 nm)/Al (0.9 nm)-oxide/Co75Fe25(4 nm)/Ir22Mn78 (12 nm)/Py(10 nm)/Cu(30 nm)/Ta(5 nm) were mircofabricated. At room temperature, TMR ratio of 18.7% and 28.4%, resistance-area products(RS) of around 10.3 and 12.7 kΩμm2 and coercivity HC of 17.5 and 2.0 Oe, were obtained for the DBMTJ at the as-deposited state and the after annealing state respectively. The micromagnetics simulations show that the dynamic butterfly-shaped domains and magnetization switching may occur in the free layer when a tunneling current of the order of 1 to 20 mA passes though the DBMTJ. It decreases the magnetization in the free layer, which may be the one of the reasons of the low TMR ratio observed in the DBMTJ.
Keywords :
annealing; coercive force; magnetic domains; magnetic tunnelling; magnetisation reversal; micromagnetics; DBMTJ; annealing state; butterfly-shaped domains; domain structure; double barrier magnetic tunnel junctions; magnetization switching; micromagnetic simulation; tunneling current; Annealing; Coercive force; Iron; Laboratories; Magnetic switching; Magnetic tunneling; Magnetization; Micromagnetics; Physics; Plasma temperature; Domain structure; magnetic tunnel junctions; micromagnetics; tunneling current-induced;
Journal_Title :
Magnetics, IEEE Transactions on
DOI :
10.1109/TMAG.2005.854818