DocumentCode :
1190184
Title :
Magnetic and half-metallic properties of Cr-doped β-SiC
Author :
Kim, Yoon-Suk ; Chung, Yong-Chae
Author_Institution :
Dept. of Ceramic Eng., Hanyang Univ., Seoul, South Korea
Volume :
41
Issue :
10
fYear :
2005
Firstpage :
2733
Lastpage :
2735
Abstract :
Using ab initio ultrasoft pseudopotential plane wave method, the effect of Cr doping concentration on the magnetic properties of β-SiC (SiC:Cr) was investigated quantitatively. It is found that the total magnetic moment of SiC:Cr is independent of the substitution site and amount of doping concentration. Using the density of states calculation, it is shown that SiC:Cr has half-metallic properties for selected doping concentrations of 1.56%, 3.13%, and 6.25%, irrespective of substitution site. The conduction electron mobility of SiC:CrC was expected to be higher than that of SiC:CrSi. On the contrary, SiC:CrSi has a wider spin band gap compared to SiC:CrC. It is predicted that SiC with 6.25% Cr doping represents desirable characteristics for realizing spintronic devices. These include half-metallic properties, high electron mobility, and a wide spin band gap with the Fermi level located at the center of the gap.
Keywords :
Fermi level; ab initio calculations; electron mobility; electronic density of states; electronic structure; energy gap; magnetic moments; magnetoelectronics; semiconductor doping; semimagnetic semiconductors; silicon compounds; Fermi level; SiC:Cr; ab initio ultrasoft pseudopotential plane wave method; diluted magnetic semiconductors; doping concentration; electron mobility; electronic structure; half-metallic properties; magnetic moment; magnetic properties; spin band gap; spintronic devices; states density calculation; Chromium; Doping; Electron mobility; Magnetic materials; Magnetic moments; Magnetic properties; Magnetization; Magnetoelectronics; Photonic band gap; Silicon carbide; diluted magnetic semiconductors; electronic structure; half-metal;
fLanguage :
English
Journal_Title :
Magnetics, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9464
Type :
jour
DOI :
10.1109/TMAG.2005.854684
Filename :
1519104
Link To Document :
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