• DocumentCode
    1191526
  • Title

    The influence of unipolar axial magnetic field on the behavior of vacuum arcs

  • Author

    Fenski, Burkhard ; Heimbach, Markus ; Shang, Wenkai

  • Author_Institution
    ABB Calor Emag Mittelspannung GmbH, Ratingen, Germany
  • Volume
    31
  • Issue
    2
  • fYear
    2003
  • fDate
    4/1/2003 12:00:00 AM
  • Firstpage
    299
  • Lastpage
    302
  • Abstract
    The behavior of vacuum arcs under the influence of unipolar axial magnetic field (AMF) has been investigated. In experimental investigations, the vacuum arc mode is studied at different arc currents by using high-speed charge-coupled device (CCD) video images. In spite of the AMF, first sign of arc constriction appears at relatively small currents of about 15 kA (RMS). Three different arc modes were found. Based on generalized Ohm´s law, the current density distribution in the vacuum arc with unipolar axial magnetic field is computed using three-dimensional finite-element method (FEM) software. The calculated current distribution is confirmed by the vacuum arc appearance taken from CCD video film. The distribution of AMF can be optimized by such experiments and theoretical analysis.
  • Keywords
    finite element analysis; magnetic field effects; magnetic flux; plasma diagnostics; plasma simulation; plasma transport processes; vacuum arcs; 15 kA; CCD video images; arc constriction; arc currents; axial magnetic field distribution optimisation; current density distribution; current distribution; finite-element simulations; generalized Ohm law; high-speed charge-coupled device; three-dimensional finite-element method; three-dimensional finite-element method software; unipolar axial magnetic field; vacuum arc mode; vacuum interrupter; Charge coupled devices; Computational modeling; Current density; Current distribution; Distributed computing; Finite element methods; Interrupters; Magnetic fields; Thermal loading; Vacuum arcs;
  • fLanguage
    English
  • Journal_Title
    Plasma Science, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0093-3813
  • Type

    jour

  • DOI
    10.1109/TPS.2003.810727
  • Filename
    1197351