• DocumentCode
    1191642
  • Title

    CMOS-Compatible Micromachined Toroid and Solenoid Inductors With High Q -Factors

  • Author

    Zine-El-Abidine, Imed ; Okoniewski, Michal

  • Author_Institution
    Calgary Univ., Alta.
  • Volume
    28
  • Issue
    3
  • fYear
    2007
  • fDate
    3/1/2007 12:00:00 AM
  • Firstpage
    226
  • Lastpage
    228
  • Abstract
    We have fabricated high-quality-factor toroid and solenoid inductors using two copper-plating steps. The inductors exhibit Q-factors as high as 87 at 14.5 GHz and 35 at 6.4 GHz. The fabrication process is low in temperature and fully compatible with CMOS technology which makes it suitable for post-IC processing
  • Keywords
    CMOS integrated circuits; Q-factor; copper; electroplating; inductors; micromachining; solenoids; 14.5 GHz; 6.4 GHz; CMOS technology; Cu; copper plating; high Q-factors; micromachining; solenoid inductors; toroid inductors; CMOS process; CMOS technology; Copper; Dielectric substrates; Etching; Fabrication; Inductors; Resists; Silicon; Solenoids; Inductors; micromachining; microwave circuits;
  • fLanguage
    English
  • Journal_Title
    Electron Device Letters, IEEE
  • Publisher
    ieee
  • ISSN
    0741-3106
  • Type

    jour

  • DOI
    10.1109/LED.2007.891259
  • Filename
    4114592
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=1191642