DocumentCode :
1191642
Title :
CMOS-Compatible Micromachined Toroid and Solenoid Inductors With High 
-Factors
Author :
Zine-El-Abidine, Imed ; Okoniewski, Michal
Author_Institution :
Calgary Univ., Alta.
Volume :
28
Issue :
3
fYear :
2007
fDate :
3/1/2007 12:00:00 AM
Firstpage :
226
Lastpage :
228
Abstract :
We have fabricated high-quality-factor toroid and solenoid inductors using two copper-plating steps. The inductors exhibit Q-factors as high as 87 at 14.5 GHz and 35 at 6.4 GHz. The fabrication process is low in temperature and fully compatible with CMOS technology which makes it suitable for post-IC processing
Keywords :
CMOS integrated circuits; Q-factor; copper; electroplating; inductors; micromachining; solenoids; 14.5 GHz; 6.4 GHz; CMOS technology; Cu; copper plating; high Q-factors; micromachining; solenoid inductors; toroid inductors; CMOS process; CMOS technology; Copper; Dielectric substrates; Etching; Fabrication; Inductors; Resists; Silicon; Solenoids; Inductors; micromachining; microwave circuits;
fLanguage :
English
Journal_Title :
Electron Device Letters, IEEE
Publisher :
ieee
ISSN :
0741-3106
Type :
jour
DOI :
10.1109/LED.2007.891259
Filename :
4114592
Link To Document :
