DocumentCode :
1192516
Title :
Threshold-Voltage Modeling of Body-Tied FinFETs (Bulk FinFETs)
Author :
Choi, Byung-Kil ; Han, Kyoung-Rok ; Kim, Young Min ; Park, Young June ; Lee, Jong-Ho
Author_Institution :
Sch. of Electr. Eng. & Comput. Sci., Kyungpook Nat. Univ., Daegu
Volume :
54
Issue :
3
fYear :
2007
fDate :
3/1/2007 12:00:00 AM
Firstpage :
537
Lastpage :
545
Abstract :
The threshold voltages Vth of the body-tied double/triple-gate MOSFETs (bulk FinFETs) implemented on bulk silicon (Si) wafers were modeled systematically and compared with data obtained from 3-D device simulation. The threshold-voltage behaviors of the bulk FinFETs were modeled, for the first time, based on charge sharing. For the simplified Vth model, we considered not only short-channel effect (SCE) and narrow-width effect but also 3-D charge sharing at the corner. Only one fitting parameter is introduced to reflect the SCE in the fin body. The model predicted the Vth behavior with fin body thickness, body doping concentration, gate height, gate length, and corner shape of the fin body well. Our compact model makes an accurate prediction of Vth and shows good agreement with 3-D simulation data
Keywords :
MOSFET; elemental semiconductors; semiconductor device models; silicon; NEW; SCE; Si; body tied; bulk FinFET; corner effect; narrow width effect; short channel effect; threshold voltage modeling; CMOS technology; FinFETs; MOSFETs; Predictive models; Semiconductor device modeling; Semiconductor process modeling; Shape; Silicon; Threshold voltage; Tunneling; Body-tied; bulk FinFET; corner effect; modeling; narrow-width effect (NWE); short-channel effect (SCE); threshold voltage;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/TED.2006.890374
Filename :
4114835
Link To Document :
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