The irreversible magnetization process in microstructured permalloy ellipses

Author

Chang, Y.C. ; Chang, C.C. ; Wu, J.C.

Author_Institution

Dept. of Phys., Nat. Changhua Univ. of Educ., Taiwan

Volume

41

Issue

10

fYear

2005

Firstpage

3742

Lastpage

3744

Abstract

Microstructured permalloy ellipses have been fabricated using electron-beam lithography through a lift-off process. The investigations were focused on the magnetization configurations and switching processes adopting magnetic force microscopy (MFM) and magnetoresistance (MR) measurements. An original five-vortex domain configuration of ellipse can be controlled and manipulated to become a four-vortex domain configuration by tuning the external magnetic field applied along the short-axis direction. In addition, an asymmetrical reversal process can be demonstrated on an ellipse having two- or three-vortex domain configuration, in which the switching fields are 36 Oe and 24 Oe, respectively.

Keywords

Permalloy; magnetic domains; magnetic materials; magnetisation reversal; asymmetrical reversal process; five-vortex domain configuration; four-vortex domain configuration; irreversible magnetization process; magnetisation reversal; magnetization switching; microstructured Permalloy ellipses; Force measurement; Lithography; Magnetic domains; Magnetic field measurement; Magnetic force microscopy; Magnetic forces; Magnetic switching; Magnetization; Magnetoresistance; Shape; Magnetic force microscopy (MFM); magnetization switching; magnetoresistance; permalloy;

fLanguage

English

Journal_Title

Magnetics, IEEE Transactions on

Publisher

ieee

ISSN

0018-9464

Type

jour

DOI

10.1109/TMAG.2005.854925

Filename

1519430