Title :
The irreversible magnetization process in microstructured permalloy ellipses
Author :
Chang, Y.C. ; Chang, C.C. ; Wu, J.C.
Author_Institution :
Dept. of Phys., Nat. Changhua Univ. of Educ., Taiwan
Abstract :
Microstructured permalloy ellipses have been fabricated using electron-beam lithography through a lift-off process. The investigations were focused on the magnetization configurations and switching processes adopting magnetic force microscopy (MFM) and magnetoresistance (MR) measurements. An original five-vortex domain configuration of ellipse can be controlled and manipulated to become a four-vortex domain configuration by tuning the external magnetic field applied along the short-axis direction. In addition, an asymmetrical reversal process can be demonstrated on an ellipse having two- or three-vortex domain configuration, in which the switching fields are 36 Oe and 24 Oe, respectively.
Keywords :
Permalloy; magnetic domains; magnetic materials; magnetisation reversal; asymmetrical reversal process; five-vortex domain configuration; four-vortex domain configuration; irreversible magnetization process; magnetisation reversal; magnetization switching; microstructured Permalloy ellipses; Force measurement; Lithography; Magnetic domains; Magnetic field measurement; Magnetic force microscopy; Magnetic forces; Magnetic switching; Magnetization; Magnetoresistance; Shape; Magnetic force microscopy (MFM); magnetization switching; magnetoresistance; permalloy;
Journal_Title :
Magnetics, IEEE Transactions on
DOI :
10.1109/TMAG.2005.854925
