Title :
One-mask process for silicon accelerometers on Pyrex glass utilising notching effect in inductively coupled plasma DRIE
Author :
Iliescu, C. ; Miao, J.
Author_Institution :
Sch. of Mech. & Production Eng., Nanyang Technol. Univ., Singapore, Singapore
fDate :
4/17/2003 12:00:00 AM
Abstract :
A one-mask process technology is proposed to fabricate silicon capacitive accelerometers using comb drive structures. A doped silicon wafer is anodically bonded on Pyrex glass substrate. High aspect ratio silicon accelerometer structures are micromachined using deep reactive ion etching (DRIE) and released from the glass substrate by further DRIE due to its notching effect.
Keywords :
accelerometers; capacitive sensors; elemental semiconductors; masks; micromachining; microsensors; silicon; sputter etching; wafer bonding; MEMS fabrication; Pyrex glass substrate; Si; anodic bonding; comb drive structure; doped silicon wafer; high aspect ratio microstructure; inductively coupled plasma DRIE; micromachining; notching effect; one-mask process technology; silicon capacitive accelerometer;
Journal_Title :
Electronics Letters
DOI :
10.1049/el:20030407
