Title :
Lithium Niobate Ridge Waveguides Fabricated by Wet Etching
Author :
Hu, H. ; Ricken, R. ; Sohler, W. ; Wehrspohn, R.B.
Author_Institution :
Dept. of Phys., Paderborn Univ.
fDate :
3/15/2007 12:00:00 AM
Abstract :
The fabrication of LiNbO3 ridge waveguides etched by a mixture of HF and HNO3 using chromium (Cr) stripes as masks is reported. Smooth etched surfaces are obtained by adding some ethanol into the etchant. Under-etching is nearly avoided by annealing the sample with the Cr masks before the wet etching process. Low-loss monomode ridge guides with a height of up to 8 mum and a width between 4.5 and 7.0 mum are demonstrated. As an example, the propagation losses in a 6.5-mum-wide and 8-mum-high structure are 0.3 dB/cm for transverse-electric and 0.9 dB/cm for transverse-magnetic polarization, respectively, at 1.55-mum wavelength
Keywords :
annealing; chromium; etching; integrated optics; light polarisation; lithium compounds; optical fabrication; optical losses; optical waveguides; ridge waveguides; 1.55 mum; 4.5 to 7.0 mum; 8 mum; Cr; Cr masks; HF-HNO3 mixture; LiNbO3; chromium stripes; etchant; ethanol; lithium niobate waveguides; low-loss ridge guides; monomode ridge guides; propagation losses; ridge waveguides; smooth surfaces; transverse-electric polarization; transverse-magnetic polarization; waveguide fabrication; wet etching; Annealing; Chromium; Ethanol; Lithium niobate; Nonlinear optics; Optical device fabrication; Optical surface waves; Optical waveguides; Planar waveguides; Wet etching; Etching; integrated optics; lithium compounds; losses; ridge waveguides;
Journal_Title :
Photonics Technology Letters, IEEE
DOI :
10.1109/LPT.2007.892886