• DocumentCode
    1194013
  • Title

    Fabrication of L10-FePt thin films by rapid thermal annealing

  • Author

    Aimuta, K. ; Nishimura, K. ; Hashi, S. ; Inoue, M.

  • Author_Institution
    Dept. of Electr. & Electron. Eng., Toyohashi Univ. of Technol., Aichi, Japan
  • Volume
    41
  • Issue
    10
  • fYear
    2005
  • Firstpage
    3898
  • Lastpage
    3900
  • Abstract
    Fabrication of L10-FePt thin films by using conventional thermal annealing and indirect rapid thermal annealing is studied. By using conventional thermal annealing, L10-FePt thin films are fabricated over 500°C. By using the rapid thermal annealing, it was found that the formation temperature of L10-FePt thin films decreases effectively. In addition, this method enables to prevent the grain growth due to annealing.
  • Keywords
    ferromagnetic materials; iron alloys; lanthanum alloys; magnetic thin films; platinum alloys; rapid thermal annealing; FePt; formation temperature; grain growth; thermal annealing; thin film fabrication; Fabrication; Magnetic anisotropy; Magnetic films; Rapid thermal annealing; Sputtering; Substrates; Surface morphology; Temperature; Thermal engineering; Transistors; Average grain diameter; L1; film surface morphology; rapid thermal annealing;
  • fLanguage
    English
  • Journal_Title
    Magnetics, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9464
  • Type

    jour

  • DOI
    10.1109/TMAG.2005.854941
  • Filename
    1519481
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=1194013