DocumentCode :
1194061
Title :
The impact of single-wafer processing on semiconductor manufacturing
Author :
Singh, Rajendra ; Fakhruddin, Mohammed ; Poole, Kelvin F.
Author_Institution :
Holcombe Dept. of Electr., Clemson Univ., SC, USA
Volume :
16
Issue :
2
fYear :
2003
fDate :
5/1/2003 12:00:00 AM
Firstpage :
96
Lastpage :
101
Abstract :
In this paper, we have described the importance of single-wafer processing (SWP) in semiconductor manufacturing. As compared to batch processing, reduced cycle time, better control of surface and interface properties, and reduced defect densities are some of the attractive features of SWP. We have provided the example of new SWP tools that have the answers to address virtually all process integration issues in dealing with new materials as well as conventional materials in ultra small dimensions. Driven by reduced I/O pitches, and emergence of system-on-chip, system-in-package or system-on-package as the driver of semiconductor growth, SWP tools have started to play an important role in the surface cleaning in IC assembly and packaging. Global acceptance of SWP in manufacturing can address the supply chain problem of the semiconductor industry.
Keywords :
integrated circuit manufacture; rapid thermal processing; surface cleaning; IC assembly; IC manufacture; IC packaging; RTP; SWP tools; cycle time; defect densities; interface properties; process integration issues; rapid thermal processing; reduced I/O pitches; semiconductor manufacturing; single-wafer processing; surface cleaning; surface properties; yield optimization; Assembly systems; Integrated circuit packaging; Manufacturing processes; Pulp manufacturing; Semiconductor device manufacture; Semiconductor device packaging; Semiconductor growth; Semiconductor materials; Surface cleaning; System-on-a-chip;
fLanguage :
English
Journal_Title :
Semiconductor Manufacturing, IEEE Transactions on
Publisher :
ieee
ISSN :
0894-6507
Type :
jour
DOI :
10.1109/TSM.2003.810941
Filename :
1198015
Link To Document :
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