• DocumentCode
    1194741
  • Title

    Optical nonlinearity of oxygen-rich SiOx thin films

  • Author

    Li, W.T. ; Boswell, R. ; Samoc, M. ; Samoc, A. ; Qin, Q.H.

  • Author_Institution
    Res. Sch. of Phys. Sci. & Eng., Australian Nat. Univ., Canberra, ACT
  • Volume
    43
  • Issue
    4
  • fYear
    2007
  • Firstpage
    235
  • Lastpage
    237
  • Abstract
    Highly oxygen-rich SiOx thin films were prepared using a helicon plasma activated reactive evaporation technique. A small second-order optical nonlinearity was observed in the as-grown films, and thermal poling induced nonlinearity in the films was found to be much larger than that in stoichiometric SiO2 films. These phenomena were associated with the non-impurity defects in the oxygen-rich films
  • Keywords
    evaporation; nonlinear optics; optical films; plasma materials processing; silicon compounds; ultraviolet spectra; visible spectra; SiOx; as-grown films; helicon plasma activated reactive evaporation; nonimpurity defects; optical nonlinearity; oxygen-rich thin films; stoichiometric films; thermal poling induced nonlinearity;
  • fLanguage
    English
  • Journal_Title
    Electronics Letters
  • Publisher
    iet
  • ISSN
    0013-5194
  • Type

    jour

  • DOI
    10.1049/el:20073668
  • Filename
    4117473
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=1194741