• DocumentCode
    1194888
  • Title

    A model for a uniform steady-state vacuum arc with a hot anode

  • Author

    Boxman, Raymond L. ; Goldsmith, S.

  • Author_Institution
    Electr. Discharge & Plasma Lab., Tel Aviv Univ., Israel
  • Volume
    17
  • Issue
    5
  • fYear
    1989
  • fDate
    10/1/1989 12:00:00 AM
  • Firstpage
    661
  • Lastpage
    665
  • Abstract
    A model is formulated and evaluated for a Uniform electrical discharge sustained in vapor evaporated from an arc-heated anode. The plasma potential is positive with respect to both the cathode and anode. For a Cu anode, the anodic vapor dominates the plasma for current densities exceeding 8 kA/m2. The anode heating potential is approximately 6.5 V, and the dominant cooling mechanism is evaporation for current densities exceeding 20 kA/m2. Over the range 10 to 10000 kA/m2, the electron density increases from 8×1017 to 5×1023 m-3, while the ionization fraction rises from 0.3% to 4%. At the lower end of this current range the electrical resistivity of 4 mΩ-m is determined primarily by electron-neutral collisions, while with increasing current the resistivity decreases to 0.7 mΩ-m, with electron-ion collisions contributing an equal share. This hot-anode vacuum arc may have potential for industrial application as a macroparticle-free high-deposition-rate coating source
  • Keywords
    arcs (electric); plasma collision processes; plasma transport processes; 6.5 V; Cu anode; Uniform electrical discharge; anode; anode heating potential; anodic vapor; arc-heated anode; cathode; current densities; electrical resistivity; electron-ion collisions; electron-neutral collisions; evaporation; hot anode; hot-anode; industrial application; macroparticle-free high-deposition-rate coating source; plasma potential; uniform steady-state vacuum arc; vapour; Anodes; Cathodes; Cooling; Current density; Electrons; Heating; Ionization; Plasma density; Steady-state; Vacuum arcs;
  • fLanguage
    English
  • Journal_Title
    Plasma Science, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0093-3813
  • Type

    jour

  • DOI
    10.1109/27.41177
  • Filename
    41177