Title :
Discussion of the linewidth enhancement factor α of GaAs/GaAlAs quantum well lasers
Author :
Hochholzer, M. ; Jordan, V.
Author_Institution :
Lehrstuhl fur Allgemeine Elektrotech. und Angewandte Elektron., Tech. Univ. Munchen, Germany
fDate :
10/1/1994 12:00:00 AM
Abstract :
The fundamental contributions of optical interband transitions and the plasma effect of free carriers to the linewidth enhancement factor α of Ga(Al)As quantum well lasers has been discussed with respect to the dependence on the main laser structure parameters: confinement profile, number of quantum wells and well width. The results show clearly that α increases with carrier density. Particularly, in SQW-SCH laser structures with thin quantum wells, α is enlarged drastically by the plasma effect due to the necessary high threshold carrier densities. Both, the use of a GRINSCH structure or a MQW laser design reduce the free carrier component of α considerably. Furthermore, only a weak dependence of the α factor on the number of quantum wells is found in the case of MQW lasers. Finally, a comparison of α-simulations and measurements on SQW-GRINSCH and SQW-SCH BCRW laser structures shows a good agreement
Keywords :
III-V semiconductors; aluminium compounds; carrier density; gallium arsenide; laser theory; laser transitions; semiconductor lasers; spectral line breadth; GRINSCH structure; Ga(Al)As quantum well lasers; GaAs-GaAlAs; GaAs/GaAlAs quantum well lasers; MQW laser design; SQW-SCH laser structures; carrier density; confinement profile; free carrier component; free carriers; high threshold carrier densities; linewidth enhancement factor; main laser structure parameters; optical interband transitions; plasma effect; quantum well number; thin quantum wells; weak dependence; well width;
Journal_Title :
Optoelectronics, IEE Proceedings -
DOI :
10.1049/ip-opt:19941299