• DocumentCode
    1196249
  • Title

    Two-dimensional analysis of the surface recombination effect on current gain for GaAlAs/GaAs HBTs

  • Author

    Hiraoka, Yoshiko Someya A ; Yoshida, Jiro

  • Author_Institution
    Toshiba Corp., Kawasaki, Japan
  • Volume
    35
  • Issue
    7
  • fYear
    1988
  • fDate
    7/1/1988 12:00:00 AM
  • Firstpage
    857
  • Lastpage
    862
  • Abstract
    Current-gain degradation induced by surface states are investigated for GaAlAs/GaAs heterojunction bipolar transistors with a mesa-type extrinsic base using a two-dimensional numerical model. Surface Fermi level pinning and surface recombination effects are introduced into the model, which is based on W.E. Spicer et al.´s (1979) unified defect model. It is shown that surface recombination is significant only at the boundary region between the intrinsic base and extrinsic base. As a result, although current gain degrades with the existence of surface states, it does not depend on the spacing between the emitter and the base electrode edges. The degradation is shown from calculations to be suppressed for a very-thin-base or a graded-base structure. The suppression is especially pronounced in the graded-base structure because of the inherent potential barrier to electrons formed in the extrinsic base layer, which prevents electrons from reaching the surface region where the recombination centers exist
  • Keywords
    III-V semiconductors; aluminium compounds; bipolar transistors; gallium arsenide; semiconductor device models; GaAlAs-GaAs; current gain degradation; degradation induced by surface states; extrinsic base; graded-base structure; heterojunction bipolar transistors; intrinsic base; mesa-type extrinsic base; semiconductors; surface Fermi level pinning; surface recombination effect on current gain; surface recombination effects; two-dimensional numerical model; unified defect model; very-thin-base; Bipolar transistors; Degradation; Electron emission; Fabrication; Gallium arsenide; Heterojunction bipolar transistors; Ion implantation; Numerical models; Photonic band gap; Spontaneous emission;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/16.3336
  • Filename
    3336