DocumentCode :
1197251
Title :
Random telegraph signal currents and low-frequency noise in junction field effect transistors
Author :
Kandiah, K.
Author_Institution :
Rutherford Appleton Lab., Chilton, UK
Volume :
41
Issue :
11
fYear :
1994
fDate :
11/1/1994 12:00:00 AM
Firstpage :
2006
Lastpage :
2015
Abstract :
The detailed study of random telegraph signal (RTS) currents and low-frequency (LF) noise in semiconductor devices in recent years has confirmed their cause and effect relationship. In this paper we describe the physical mechanisms responsible for RTS currents in any device. The methods for calculating the amplitudes and characteristic times of the RTS currents produced by traps with known electrical characteristics and locations are described. The noise spectra in junction field effect transistors (JFET´s) resulting from traps in the silicon or the oxide are derived as a function of basic device parameters, operating conditions and temperature. Experimental results verifying the predictions of the models are presented
Keywords :
electron traps; hole traps; junction gate field effect transistors; semiconductor device models; semiconductor device noise; JFET; LF noise; junction field effect transistors; low-frequency noise; models; noise spectra; physical mechanisms; random telegraph signal currents; semiconductor devices; traps; Bipolar transistors; Charge carrier density; FETs; Fluctuations; Low-frequency noise; Semiconductor device noise; Semiconductor devices; Silicon; Telegraphy; Temperature;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/16.333818
Filename :
333818
Link To Document :
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