DocumentCode :
1197975
Title :
Pulse-doped AlGaAs/InGaAs pseudomorphic MODFETs
Author :
Moll, Nick ; Hueschen, Mark R. ; Fischer-Colbrie, Alice
Author_Institution :
Hewlett-Packard Lab., Palo Alto, CA, USA
Volume :
35
Issue :
7
fYear :
1988
fDate :
7/1/1988 12:00:00 AM
Firstpage :
879
Lastpage :
886
Abstract :
MODFETs have been fabricated using heterojunctions consisting of AlGaAs and pseudomorphic InGaAs, grown on GaAs substrates. The large conduction band discontinuity (about 0.46 eV for 25% In and Al concentration) leads to a 2-D electron density as high as 2.3×10 12 cm-2, with electron mobilities of 7000 and 16000 cm2/V-s at 300 and 77 K, respectively. Such a high electron density in combination with reasonable transport properties leads to MODFETs with exceptional characteristics. Devices with 0.15-0.25-μm gate length have room-temperature drain currents as high as 600 mA/mm and room-temperature transconductance as high as 500 mS/mm. The fT is as high as 98 GHz, as determined by 20-dB/decade extrapolation of microwave data taken to 25 GHz. A comparison of the effect of bias on the total delay through standard and pseudomorphic MODFETs suggests that the excellent microwave performance exhibited by the pseudomorphic device arises from a reduction in parasitic and drain delays and not from a higher electron velocity under the gate
Keywords :
III-V semiconductors; aluminium compounds; gallium arsenide; high electron mobility transistors; indium compounds; semiconductor doping; solid-state microwave devices; 0.46 eV; 150 to 250 nm; 2-D electron density; 300 K; 77 K; 98 GHz; AlGaAs-InGaAs; GaAs substrates; HEMT; conduction band discontinuity; effect of bias; electron mobilities; gate length; microwave performance; pseudomorphic InGaAs; pseudomorphic MODFETs; pulse doping; room-temperature drain currents; room-temperature transconductance; semiconductor; Delay effects; Electron mobility; Extrapolation; Gallium arsenide; HEMTs; Heterojunctions; Indium gallium arsenide; MODFETs; Microwave devices; Transconductance;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/16.3339
Filename :
3339
Link To Document :
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