Off-track capability of a pole trimmed thin film head

Author

Fukuda, K. ; Sakai, M. ; Yamanaka, N. ; Iijima, A. ; Matsuzaki, M.

Author_Institution

Data Storage Components Bus. Group, TDK Corp., Nagano, Japan

Volume

30

Issue

6

fYear

1994

fDate

11/1/1994 12:00:00 AM

Firstpage

3891

Lastpage

3893

Abstract

In order to improve off-track capability and thus to achieve higher track density, both sides of the upper and lower pole tips of inductive thin film heads were trimmed to become nearly the same in width, through photolithography and ion milling processes at the air bearing surface. The off-track capability improvement attained by the pole trimming was experimentally estimated by performing off-track profile evaluation and “747 curve” measurement. The difference between the effective track width and the upper pole width, which represents the amount of track side writing and side crosstalk effect, was found to be reduced to 68% of that seen in conventional thin film heads. It was also found that the track interval can be squeezed by as much as 1.0 μm more than conventional thin film heads, based on the 747 curve comparison

Keywords

crosstalk; ion beam applications; magnetic heads; magnetic thin film devices; photolithography; 747 curve; air bearing surface; inductive thin film heads; ion milling processes; off-track capability; off-track profile evaluation; photolithography; pole trimmed thin film head; side crosstalk effect; track density; track interval; track side writing; Etching; Fabrication; Head; Lithography; Memory; Milling; Performance evaluation; Rails; Resists; Transistors;

fLanguage

English

Journal_Title

Magnetics, IEEE Transactions on

Publisher

ieee

ISSN

0018-9464

Type

jour

DOI

10.1109/20.333935

Filename

333935