Title :
Stress, microstructure and materials reliability of sputter-deposited Fe-N films
Author :
Narayan, P.B. ; Kim, Y.K.
Author_Institution :
Rocky Mountain Magnetics Inc., Louisville, CO, USA
fDate :
11/1/1994 12:00:00 AM
Abstract :
Sputtered Fe-N films with various nitrogen contents were investigated from point of view of device manufacturing. As-deposited Fe-N films have compressive stress that becomes tensile due to heat treatment. At optimum N content where soft magnetic properties were realized, the film shows a close to amorphous microstructure. Compared to NiFe, Fe-N has higher reactivity with humidity and lower reactivity with atmospheric pollutants such as Cl and S
Keywords :
ferromagnetic materials; heat treatment; internal stresses; iron compounds; magnetic thin films; soft magnetic materials; sputtered coatings; Fe-N; amorphous microstructure; atmospheric pollutants; device manufacturing; heat treatment; humidity; materials reliability; microstructure; nitrogen contents; reactivity; soft magnetic properties; sputter-deposited Fe-N films; stress; Amorphous materials; Compressive stress; Heat treatment; Magnetic films; Magnetic properties; Manufacturing; Materials reliability; Microstructure; Nitrogen; Tensile stress;
Journal_Title :
Magnetics, IEEE Transactions on
