Title :
FeSiN films for a narrow track head
Author :
Kadono, M. ; Yamamoto, T. ; Michijima, M. ; Kyoho, M. ; Matsuda, T. ; Muramatsu, T.
Author_Institution :
Precision Technol. Dev. Center, Sharp Corp., Nara, Japan
fDate :
11/1/1994 12:00:00 AM
Abstract :
FeSiN films for a narrow track head have been studied, utilizing the ion beam reactive sputtering method. By controlling both nitrogen flow ratio and substrate temperature, the low-Si-content FeSiN films with (112) orientation were obtained. The magnetostriction was reduced by this orientation, and good soft magnetic properties appeared. The saturation magnetic flux density of the films was 1.7 T. The 7.5 μm trackwidth FeSiN heads showed good recording and reproducing characteristics
Keywords :
ferromagnetic materials; iron compounds; magnetic heads; magnetic thin film devices; magnetostrictive devices; silicon compounds; soft magnetic materials; sputtered coatings; 1.7 T; 7.5 micron; FeSiN; FeSiN films; ion beam reactive sputtering; magnetostriction; narrow track head; nitrogen flow ratio; orientation; recording characteristics; reproducing characteristics; saturation magnetic flux density; soft magnetic properties; substrate temperature; Ion beams; Magnetic films; Magnetic flux density; Magnetic heads; Magnetic properties; Magnetic recording; Magnetostriction; Nitrogen; Sputtering; Temperature control;
Journal_Title :
Magnetics, IEEE Transactions on
