X-ray diffraction and magnetic properties of rapid thermal annealed sendust films

Author

Ullah, M.I. ; Coffey, K.R. ; Parker, M.A. ; Howard, J. Kent

Author_Institution

Storage Syst. Div., IBM Corp., San Jose, CA, USA

Volume

30

Issue

6

fYear

1994

fDate

11/1/1994 12:00:00 AM

Firstpage

3927

Lastpage

3929

Abstract

A rapid thermal annealing (RTA) process for sputter deposited sendust (FeSiAl) films is described and the effects of different annealing conditions on key soft magnetic parameters are discussed. X-ray diffraction is used to understand the microstructure of the RTA sendust films and to establish the presence of the ordered DO₃ phase. AFM and SEM micrographs are used to describe the morphology of these films

Keywords

X-ray diffraction; aluminium alloys; atomic force microscopy; ferromagnetic materials; iron alloys; magnetic thin films; rapid thermal annealing; scanning electron microscopy; silicon alloys; soft magnetic materials; sputtered coatings; AFM micrographs; FeSiAl; SEM micrographs; X-ray diffraction; magnetic properties; microstructure; morphology; ordered DO₃ phase; rapid thermal annealing; soft magnetic parameters; sputter deposited sendust films; Coercive force; Magnetic anisotropy; Magnetic films; Magnetic properties; Perpendicular magnetic anisotropy; Rapid thermal annealing; Rapid thermal processing; Saturation magnetization; Soft magnetic materials; X-ray diffraction;

fLanguage

English

Journal_Title

Magnetics, IEEE Transactions on

Publisher

ieee

ISSN

0018-9464

Type

jour

DOI

10.1109/20.333946

Filename

333946