• DocumentCode
    1198713
  • Title

    High coercivity FeSmN thin films for longitudinal magnetic recording media

  • Author

    Wang, D. ; Doyle, W.D.

  • Author_Institution
    Dept. of Phys., Alabama Univ., Tuscaloosa, AL, USA
  • Volume
    30
  • Issue
    6
  • fYear
    1994
  • fDate
    11/1/1994 12:00:00 AM
  • Firstpage
    4032
  • Lastpage
    4034
  • Abstract
    FeSm thin films with an Fe/Sm atomic ratio of 9.2 have been deposited by dc magnetron sputtering on Ta and Cu substrates held at 400°C. FeSmN films with in-plane easy axes were obtained by annealing the FeSm films in-situ under a nitrogen atmosphere of 300 Torr at a temperature of 400°C. The coercivity of the FeSmN films varies from 2 kOe to as high as 7 kOe depending on the deposition conditions. Typical FeSmN films have a magnetization of ~140 emu/g, a squareness of 0.90 and a coercivity squareness of 0.75. It was found that when a Cr underlayer was deposited at a substrate temperature of 350°C, FeSmN films of 150 nm thickness with an in-plane coercivity of 6.4 kOe, a squareness of 0.90 and a coercivity squareness of 0.6 were obtained
  • Keywords
    annealing; coercive force; ferromagnetic materials; iron alloys; magnetic recording; magnetic thin films; magnetisation; samarium alloys; sputtered coatings; 300 torr; 350 C; 400 C; Cr; Cr underlayer; Cu; Cu substrates; DC magnetron sputtering; FeSmN; Ta; Ta substrates; coercivity; coercivity squareness; easy axes; high coercivity FeSmN thin films; longitudinal magnetic recording; magnetization; nitrogen annealing; squareness; Annealing; Atmosphere; Atomic layer deposition; Coercive force; Iron; Magnetic films; Magnetization; Nitrogen; Sputtering; Temperature;
  • fLanguage
    English
  • Journal_Title
    Magnetics, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9464
  • Type

    jour

  • DOI
    10.1109/20.333980
  • Filename
    333980