• DocumentCode
    1200524
  • Title

    Generation of intense pulsed electron beams by the pseudospark discharge

  • Author

    Benker, Winfried ; Christiansen, Jens ; Frank, Klaus ; Gundel, Hartmut ; Hartmann, Werner ; Redel, Thomas ; Stetter, Michael

  • Author_Institution
    Inst. of Phys., Erlangen-Nuremberg Univ., West Germany
  • Volume
    17
  • Issue
    5
  • fYear
    1989
  • fDate
    10/1/1989 12:00:00 AM
  • Firstpage
    754
  • Lastpage
    757
  • Abstract
    A low-pressure gas discharge is presented as a source of intense pulsed electron beams. The pseudospark discharge emits a short-duration pinched electron beam during the breakdown phase. At voltages of typically 20 kV, approximately 10-20% of the total discharge current appears as the electron-beam current of typically 20 ns in duration. According to the breakdown voltage in the beam, a power density on the order of 109 W/cm2 is reached. Thus, this electron beam turns out to be a good tool for material processing, comparable to pulsed high-power lasers. Besides the drilling of holes into metals and insulators, an interesting application is the production of high-temperature superconducting thing YBa2Cu3O 7-x films. The electron beam is used to evaporate material from a stoichiometric 1-2-3 target. Experimental results concerning the propagation behavior in neutral gas, the electron energy distribution, and the interaction with matter are reported
  • Keywords
    electron beams; electron sources; sparks; 20 kV; 20 ns; YBa2Cu3O7-x; breakdown phase; drilling; electron energy distribution; evaporation; generation; high temperature superconducting thin film production; high-temperature superconducting thing YBa2Cu3 O7-x films; insulators; intense pulsed electron beams; low-pressure gas discharge; material processing; metals; neutral gas; power density; pseudospark discharge; pulsed high-power lasers; short-duration pinched electron beam; source; stoichiometric 1-2-3 target; Discharges; Electric breakdown; Electron beams; Fault location; Laser beams; Materials processing; Optical pulses; Pulse generation; Superconducting films; Voltage;
  • fLanguage
    English
  • Journal_Title
    Plasma Science, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0093-3813
  • Type

    jour

  • DOI
    10.1109/27.41196
  • Filename
    41196