DocumentCode :
1200611
Title :
Analysis of 0.1 to 0.3 micron wide, ultra dense GMR memory elements
Author :
Pohm, A.V. ; Beech, R.S. ; Bade, P.A. ; Chen, E.Y. ; Daughton, J.M.
Author_Institution :
NVE Inc, Eden Prairie, MN, USA
Volume :
30
Issue :
6
fYear :
1994
fDate :
11/1/1994 12:00:00 AM
Firstpage :
4650
Lastpage :
4652
Abstract :
A micro magnetic analysis, has been performed for ultra dense magnetoresistive memory cells employing giant magnetoresistive materials that have array densities from 2×108 to 109 elements per square cm. The analysis shows that as elements are made smaller, it is necessary to increase the effective anisotropy constant by increasing the demagnetizing factor in the long dimension of the element (or by finding GMR materials with large anisotropy fields). With diminishing cell size, exchange torque becomes progressively more important, and depending in detail on the thickness of the magnetic and separation layers, the layers ultimately act semi-coherently. Cell widths are eventually limited to values between 0.05 and 0.1 microns by thermal considerations because the smaller cells require progressively larger word and sense fields. The analysis assumed GMR elements made from magnetic layers 50 to 60 Angstroms thick of Ni, Fe, Co alloys with Cu, Ag, or Au separation layers of 15 to 30 Angstroms and with a magnetoresistive coefficient of 6 to 9%
Keywords :
exchange interactions (electron); giant magnetoresistance; magnetic anisotropy; magnetic multilayers; magnetic storage; 0.1 to 0.3 mum; demagnetizing factor; diminishing cell size; effective anisotropy constant; exchange torque; giant magnetoresistive materials; micro magnetic analysis; ultra dense GMR memory elements; ultra dense magnetoresistive memory cells; Anisotropic magnetoresistance; Demagnetization; Giant magnetoresistance; Iron; Magnetic analysis; Magnetic anisotropy; Magnetic materials; Magnetic separation; Perpendicular magnetic anisotropy; Torque;
fLanguage :
English
Journal_Title :
Magnetics, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9464
Type :
jour
DOI :
10.1109/20.334178
Filename :
334178
Link To Document :
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