DocumentCode :
1203881
Title :
Fabrication of domain-inverted gratings in MgO:LiNbO3 by applying voltage under ultraviolet irradiation through photomask at room temperature
Author :
Fujimura, M. ; Sohmura, T. ; Suhara, T.
Author_Institution :
Dept. of Electron., Osaka Univ., Suita, Japan
Volume :
39
Issue :
9
fYear :
2003
fDate :
5/1/2003 12:00:00 AM
Firstpage :
719
Lastpage :
721
Abstract :
A new and simple fabrication method of domain-inverted gratings in MgO:LiNbO3 is demonstrated. It was found that ultraviolet (UV) light irradiation reduces the voltage for inversion. Domain-inverted gratings of ∼15 μm period were fabricated by voltage application at room temperature under irradiation of UV light periodically-patterned using a photomask.
Keywords :
diffraction gratings; electric domains; lithium compounds; magnesium compounds; masks; optical fabrication; ultraviolet radiation effects; LiNbO3:MgO; MgO:LiNbO3 domain-inverted grating; fabrication method; photomask; room temperature; ultraviolet irradiation; voltage application;
fLanguage :
English
Journal_Title :
Electronics Letters
Publisher :
iet
ISSN :
0013-5194
Type :
jour
DOI :
10.1049/el:20030492
Filename :
1199952
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=1203881
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