• DocumentCode
    1203881
  • Title

    Fabrication of domain-inverted gratings in MgO:LiNbO3 by applying voltage under ultraviolet irradiation through photomask at room temperature

  • Author

    Fujimura, M. ; Sohmura, T. ; Suhara, T.

  • Author_Institution
    Dept. of Electron., Osaka Univ., Suita, Japan
  • Volume
    39
  • Issue
    9
  • fYear
    2003
  • fDate
    5/1/2003 12:00:00 AM
  • Firstpage
    719
  • Lastpage
    721
  • Abstract
    A new and simple fabrication method of domain-inverted gratings in MgO:LiNbO3 is demonstrated. It was found that ultraviolet (UV) light irradiation reduces the voltage for inversion. Domain-inverted gratings of ∼15 μm period were fabricated by voltage application at room temperature under irradiation of UV light periodically-patterned using a photomask.
  • Keywords
    diffraction gratings; electric domains; lithium compounds; magnesium compounds; masks; optical fabrication; ultraviolet radiation effects; LiNbO3:MgO; MgO:LiNbO3 domain-inverted grating; fabrication method; photomask; room temperature; ultraviolet irradiation; voltage application;
  • fLanguage
    English
  • Journal_Title
    Electronics Letters
  • Publisher
    iet
  • ISSN
    0013-5194
  • Type

    jour

  • DOI
    10.1049/el:20030492
  • Filename
    1199952
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=1203881