DocumentCode :
1203888
Title :
Importance of the Gate-Dependent Polarization Charge on the Operation of GaN HEMTs
Author :
Ashok, Ashwin ; Vasileska, Dragica ; Goodnick, Stephen M. ; Hartin, Olin L.
Author_Institution :
Intel Corp., Santa Clara, CA
Volume :
56
Issue :
5
fYear :
2009
fDate :
5/1/2009 12:00:00 AM
Firstpage :
998
Lastpage :
1006
Abstract :
We investigate the influence of the gate-voltage dependence of the polarization charge on the electron sheet charge density in the channel and how it reflects on the device transfer and output characteristics in GaN HEMTs. We find that a 10% increase in the polarization charge is needed to match the experimental data when the gate-voltage dependence of the polarization charge is included in the theoretical model. This information is important for calibration in commercial device simulators and for better understanding of the quality of the GaN/AlGaN interface.
Keywords :
III-V semiconductors; aluminium compounds; gallium compounds; high electron mobility transistors; semiconductor device models; wide band gap semiconductors; GaN-AlGaN; HEMT; device transfer; electron sheet charge density; gate-dependent polarization charge; gate-voltage dependence; Acoustic scattering; Aluminum gallium nitride; Electrons; Gallium arsenide; Gallium nitride; HEMTs; MODFETs; Optical scattering; Phonons; Polarization; GaN devices; gate-voltage dependence; polarization charge;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/TED.2009.2015822
Filename :
4804770
Link To Document :
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